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KMID : 0385519920050030303
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Analytical Science & Technology
1992 Volume.5 No. 3 p.303 ~ p.308
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Initial Reactions of Ti on the Atomically Clean Si Substrates
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Jeon Hyeongtag
R.J. Nemanrich
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Abstract
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Surface roughness, Reconstruction, Disordered laye
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KEYWORD
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